Developer for Thermal and CTcP-UV positive plates. Direct Use.
Properties
- DURABILITY: Its specific formulation permits high productivity under square meters developed.
- CLEANING: Its dissolution capability reduces the accumulation of emulsion in the filters, rollers and developing tank.
- COMPATIBILITY: Capable to develop almost all positive Thermal CTP and CTcP UV plates (except closed systems).
- Non-aggressive to the anodizing layer of the plates.
- Buffered agents to minimize the aggression to the image area.
- It contains corrosion inhibitors.
- Low replenishment rate reduces the consumption and recycling when used with PLATEA RD1.
How to use
Ready to use developer.
Fill the processor machine with developer PLATEA D11:
| Working temperature: | General set: 23ºC ± 1ºC | (Look for specific setting on plate’s TDS) | |
| Dwell time: | General set: 30” ± 5” secs | (Look for specific setting on plate’s TDS) | |
| Replenisher: | __________________________ Replenishment rate Anti-ox Standby ON Anti-ox Standby OFF | D11 120 ml/m² 100 ml/h 100 ml/h | RD1 50 – 70 ml/m² 40 – 60 ml/h 40 – 60 ml/h |
** These values may vary depending on the conditions and type of the processor.
SUGGESTIONS
Initial bath’s charge must be always with developer PLATEA D11.
Adequate replenishment keeps filters and circulation systems clean prolonging the life of the bath.
Correct cleaning of the equipment will avoid contamination of the new bath and prolong the life of the processor. Clean using LPR-5 and LP-1.
Packaging
- ✓ 20 liters.
- ✓ 200 liters.
- ✓ 1.000 liters.