Ready to use replenisher for Developer PLATEA D11. Direct use.
Properties
- DURABILITY: Its specific formulation permits high productivity under square meters developed.
- CLEANING: Its dissolution capability reduces the accumulation of emulsion in the filters, rollers and developing tank.
- Non-aggressive to the anodizing layer of the plates.
- Buffered agents to minimize the aggression to the image area.
- It contains corrosion inhibitors.
- Low replenishment rate reduces the consumption and recycling.
How to use
Ready to use replenisher for Developer PLATEA D11
Fill the processor machine with developer PLATEA D11:
| Working temperature: | General set: 23ºC ± 1ºC | (Look for specific setting on plate’s TDS) |
| Dwell time: | General set: 30” ± 5” secs | (Look for specific setting on plate’s TDS) |
| Replenisher: | Replenishment rate Anti-ox Standby ON Anti-ox Standby OFF | RD1 50 – 70 ml/m² 40 – 60 ml/h 40 – 60 ml/h |
** These values may vary depending on the conditions and type of the processor.
SUGGESTIONS
- Initial bath’s charge must be always with developer PLATEA D11.
- Adequate replenishment keeps filters and circulation systems clean prolonging the life of the bath.
- Correct cleaning of the equipment will avoid contamination of the new bath and prolong the life of the processor. Clean using LPR-5 and LP-1.
PACKAGING
- 20 liters.
- 200 liters.
- 1000 liters.